JSR & Lam Ink Deal to Boost EUV and Dry Resist Tech

 

JSR Corporation, a world leader in materials innovation and parent company to Inpria Corporation, has signed a non-exclusive cross-licensing and joint development agreement with Lam Research Corporation, a worldwide semiconductor manufacturing equipment provider, to promote the industry's transition to next-generation patterning and dry resist technologies for EUV (extreme ultraviolet) lithography.

The collaboration takes advantage of JSR/Inpria's leading-edge metal oxide photoresists and Lam's deposition, etch, and EUV patterning technology, including its Aether dry resist technology, a significant innovation intended to streamline and lower the cost of chip fabrication for AI and high-performance computing (HPC).

"By uniting JSR and Inpria's material know-how with Lam's expertise in deposition, etch, and dry resist technologies, we're positioning ourselves to drive solutions for EUV lithography – high NA included – and enable the industry to scale effectively for the new AI era," stated Toru Kimura, Senior Officer, JSR Corporation.

Key highlights:

• JSR Corporation and Lam Research have entered a non-exclusive cross-licensing and joint development agreement to accelerate next-generation EUV lithography and dry resist technologies, vital for AI and HPC chip manufacturing
• The collaboration will integrate JSR/Inpria’s advanced metal oxide photoresists with Lam’s Aether dry resist platform, aiming to reduce cost and complexity in semiconductor patterning for advanced nodes
• The partnership also includes joint R&D into metal oxide resists, high NA EUV, and atomic layer processes, leveraging JSR’s recent acquisition of Yamanaka Hutech to explore new precursor materials and etch innovations

Under the pact, the two firms will collaboratively develop and integrate sophisticated patterning materials and etch processes, focusing on innovation in metal oxide resists, high NA EUV, and atomic layer deposition. JSR's recent acquisition of Yamanaka Hutech Corporation will also be used to research new precursors and process innovation.

Also Read: Micron Technology To Invest JPY 500B In EUV Technology With Government Aid

"This partnership allows us to speed innovation during a period of increasing semiconductor complexity. We look forward to making Aether more accessible and pushing forward next-generation EUV solutions." stated Vahid Vahedi, Chief Technology and Sustainability Officer, Lam Research.

The deal puts both firms in position to address chipmakers' scaling demands in the face of the needs of the AI era.